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An epitaxial NbN–Co VAN thin film was deposited on a MgO substrate with a cubic NbN phase, which presents ferromagnet properties with strong out-of-plane magnetic anisotropy. This hybrid metamaterial could find future applications in device design. 

Abstract Complex oxide thin films cover a range of physical properties and multifunctionalities that are critical for logic, memory, and optical devices. Typically, the high‐quality epitaxial growth of these complex oxide thin films requires single crystalline oxide substrates such as SrTiO₃(STO), MgO, LaAlO₃, a‐Al₂O_3,and many others. Recent successes in transferring these complex oxides as free‐standing films not only offer great opportunities in integrating complex oxides on other devices, but also present enormous opportunities in recycling the deposited substrates after transfer for cost‐effective and sustainable processing of complex oxide thin films. In this work, the surface modification effects introduced on the recycled STO are investigated, and their impacts on the microstructure and properties of subsequently grown epitaxial oxide thin films are assessed and compared with those grown on the pristine substrates. Detailed analyses using high‐resolution scanning transmission electron microscopy and geometric phase analysis demonstrate distinct strain states on the surfaces of the recycled STO versus the pristine substrates, suggesting a pre‐strain state in the recycled STO substrates due to the previous deposition layer. These findings offer opportunities in growing highly mismatched oxide films on the recycled STO substrates with enhanced physical properties. Specifically, yttrium iron garnet (Y₃Fe₅O₁₂) films grown on recycled STO present different ferromagnetic responses compared to that on the pristine substrates, underscoring the effects of surface modification. The study demonstrates the feasibility of reuse and redeposition using recycled substrates. Via careful handling and preparation, high‐quality epitaxial thin films can be grown on recycled substrates with comparable or even better structural and physical properties toward sustainable process of complex oxide devices. 

Contact engineering on monolayer layer (ML) semiconducting transition metal dichalcogenides (TMDs) is considered the most challenging problem towards using these materials as a transistor channel in future advanced technology nodes. The typically observed strong Femi level pinning induced in part by the reaction of the source/drain contact metal and the ML TMD frequently results in a large Schottky barrier height, which limits the electrical performance of ML TMD field-effect transistors (FETs). However, at a microscopic level, little is known about how interface defects or reaction sites impact the electrical performance of ML TMD FETs. In this work, we have performed statistically meaningful electrical measurements on at least 120 FETs combined with careful surface analysis to unveil contact resistance dependencies on the interface chemistry. In particular, we achieved a low contact resistance for ML MoS2 FETs with ultra-high vacuum (UHV, 3×10-11 mbar) deposited Ni contacts, ~500 ohm·μm, which is 5 times lower than the contact resistance achieved when deposited at high vacuum (HV, 3×10-6 mbar) conditions. These electrical results strongly correlate with our surface analysis observations. X-ray photoelectron spectroscopy (XPS) revealed significant bonding species between Ni and MoS2 under UHV conditions compared to HV. We also studied the Bi/MoS2 interface under UHV and HV deposition conditions. Different from the case of Ni, we do not observe a difference in contact resistance or interface chemistry between contacts deposited under UHV and HV. Finally, this article also explores the thermal stability and reliability of the two contact metals employed here. 

Magnetic and ferroelectric oxide thin films have long been studied for their applications in electronics, optics, and sensors. The properties of these oxide thin films are highly dependent on the film growth quality and conditions. To maximize the film quality, epitaxial oxide thin films are frequently grown on single‐crystal oxide substrates such as strontium titanate (SrTiO₃) and lanthanum aluminate (LaAlO₃) to satisfy lattice matching and minimize defect formation. However, these single‐crystal oxide substrates cannot readily be used in practical applications due to their high cost, limited availability, and small wafer sizes. One leading solution to this challenge is film transfer. In this demonstration, a material from a new class of multiferroic oxides is selected, namely bismuth‐based layered oxides, for the transfer. A water‐soluble sacrificial layer of Sr₃Al₂O₆is inserted between the oxide substrate and the film, enabling the release of the film from the original substrate onto a polymer support layer. The films are transferred onto new substrates of silicon and lithium niobate (LiNbO₃) and the polymer layer is removed. These substrates allow for the future design of electronic and optical devices as well as sensors using this new group of multiferroic layered oxide films. 

High critical current (Ic) in high magnetic fields (B) with minimal variations with respect to the orientation of the B field is demanded by many applications such as high-field magnets for fusion systems. Motivated by this, this work studies 6 vol. % BaZrO3/YBa2Cu3O7 (BZO/YBCO) multilayer nanocomposite films by stacking two 10 nm thick Ca0.3Y0.7Ba2Cu3O7 (CaY-123) spacers with three BZO/YBCO layers of thickness varied from 50 to 330 nm to make the total film thickness of 150–1000 nm. The Ca diffusion from the spacers into BZO/YBCO was shown to dramatically enhance pinning efficiency of c-axis aligned BZO nanorods, which yields high and almost thickness independent critical current density (Jc) in the BZO/YBCO multilayer nanocomposite films. Remarkably, enhanced Jc was observed in these multilayer samples at a wide temperature range of 20–80 K and magnetic fields up to 9.0 T. In particular, the thicker BZO/YBCO multilayer films outperform their thinner counterparts in both higher value and less anisotropy of Jc at lower temperatures and higher fields. At 20 K and 9.0 T, Ic is up to 654 A/cm-width at B//c in the 6% multilayer (1000 nm) sample, which is close to 753 A/cm-width at B//ab due to the intrinsic pinning. This result illustrates the critical role of the Ca cation diffusion into the YBCO lattice in achieving high and isotropic pinning in thick BZO/YBCO multilayer films.